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Author:
Schefflan, Ralph, author. http://id.loc.gov/authorities/names/n2010033355
Title:
Teach yourself the basics of Aspen plusTM /
Ralph Schefflan.
Edition:
Second edition.
Publisher:
John Wiley & Sons Inc.,
Copyright Date:
2016
Description:
xvii, 257 pages : illustrations ; 26 cm
Subject:
Chemical processes--Computer simulation.
Chemical process control--Computer programs.
Aspen plus.
ASPEN PLUS.
Chemical process control--Computer programs.
Chemical processes--Computer simulation.
Notes:
Includes bibliographical references and index.
ISBN:
111898059X
9781118980590
OCLC:
(OCoLC)948360858
LCCN:
2016015709
Locations:
OVUX522 --
University of Iowa Libraries
(Iowa City)
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