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Author:
Nakamura, Kenichiro (Chemical engineer)
Title:
Photopolymers : photoresist materials, processes, and applications / Kenichiro Nakamura.
Publisher:
CRC Press,
Copyright Date:
2014
Description:
ix, 179 pages : illustrations ; 24 cm
Subject:
Photopolymers.
Photoresists.
Photopolymerization.
Photopolymers--Industrial applications.
Microelectronics--Materials.
SCIENCE / Chemistry / Industrial & Technical.
TECHNOLOGY & ENGINEERING / Lasers & Photonics.
TECHNOLOGY & ENGINEERING / Material Science.
Microelectronics--Materials.
Photopolymerization.
Photopolymers.
Photopolymers--Industrial applications.
Photoresists.
Notes:
"Version Date: 20140618"--Verso of title page. Includes bibliographical references and index.
Summary:
"Advancements in photopolymers have led to groundbreaking achievements in electronic, optical, and medical engineering. At present, photopolymers have myriad applications in semiconductor device manufacturing, printed circuit boards (PCBs), ultraviolet (UV) curing, microelectromechanical systems (MEMS), and medical materials. Addressing topics such as chemically amplified resists, immersion lithography, extreme ultraviolet (EUV) lithography, and nanoimprinting, this book covers photopolymers from core concepts to industrial applications, providing the chemical formulae and structures of the materials discussed as well as practical case studies from some of the world's largest corporations"-- Provided by publisher.
Series:
Optics and photonics ; 10
ISBN:
146651728X (hardback : acid-free paper)
9781466517288 (hardback : acid-free paper)
OCLC:
(OCoLC)773024916
LCCN:
2014006188
Locations:
OVUX522 -- University of Iowa Libraries (Iowa City)

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