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Title:
Plasma etching for CMOS devices realization /
edited by Nicolas Posseme.
Publisher:
ISTE Press Ltd ;
Copyright Date:
2017
Description:
x, 121 pages : illustrations ; 24 cm.
Subject:
Metal oxide semiconductors, Complementary--Design and construction.
Plasma etching.
Other Authors:
Posseme, Nicolas, editor.
Notes:
Includes bibliographical references.
Series:
Electronics engineering
ISBN:
9781785480966
1785480960
OCLC:
(OCoLC)960278774
Locations:
USUX851 --
Iowa State University - Parks Library
(Ames)
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