54 records matched your query       

01075aam a2200301Mi 4500
001 1959A89C2FC611E7A3652FCCDAD10320
003 SILO
005 20170503010126
008 161012s2017    enka     b    000 0 eng d
020    $a 9781785480966
020    $a 1785480960
035    $a (OCoLC)960278774
040    $a YDX $b eng $e rda $c YDX $d SILO
050  4 $a TK7871.99.M44 $b P63 2017
082 04 $a 621.39/732 $2 23
245 00 $a Plasma etching for CMOS devices realization / $c edited by Nicolas Posseme.
264  1 $a London : $b ISTE Press Ltd ; $c 2017.
300    $a x, 121 pages : $b illustrations ; $c 24 cm.
490 1  $a Electronics engineering
504    $a Includes bibliographical references.
650  0 $a Metal oxide semiconductors, Complementary $x Design and construction.
650  0 $a Plasma etching.
700 1  $a Posseme, Nicolas, $e editor.
830  0 $a Electronics engineering series (London, England)
941    $a 1
952    $l USUX851 $d 20170706035421.0
956    $a http://locator.silo.lib.ia.us/search.cgi?index_0=id&term_0=1959A89C2FC611E7A3652FCCDAD10320
994    $a 92 $b IWA